Abstract:Femtosecond laser-induced periodic surface structures (LIPSS) have several applications in surface structuring and functionalization. Three major challenges exist in the fabrication of regular and uniform LIPSS: enhancing the periodic energy deposition, reducing the residual heat, and avoiding the deposited debris. Herein, we fabricate an extremely regular low-spatial-frequency LIPSS (LSFL) on a silicon surface by a temporally shaped femtosecond laser. Based on a 4f configuration zero-dispersion pulse shaping system, a Fourier transform limit (FTL) pulse is shaped into a pulse train with varying intervals in the range of 0.25–16.2 ps using periodic π-phase step modulation. Under the irradiation of the shaped pulse with an interval of 16.2 ps, extremely regular LSFLs are efficiently fabricated on silicon. The scan velocity for fabricating regular LSFL is 2.3 times faster, while the LSFL depth is 2 times deeper, and the diffraction efficiency is 3 times higher than those of LSFL using the FTL pulse. The formation mechanisms of regular LSFL have been studied experimentally and theoretically. The results show that the temporally shaped pulse enhances the excitation of surface plasmon polaritons and the periodic energy deposition while reducing the residual thermal effects and avoiding the deposition of the ejected debris, eventually resulting in regular and deeper LSFL on the silicon surface.

Fabrication of Two-Dimensional Periodic Structures on Silicon after Scanning Irradiation with Femtosecond Laser Multi-Beams

Research on Periodic Structures Aroused by Femtosecond Laser Irradiation on Single-Crystalline Silicon Wafer

Progressive Evolution of Silicon Surface Microstructures Via Femtosecond Laser Irradiation in Ambient Air

Deep Investigation of Two-Dimensional Structure Arrays Formed on Si Surface

Femtosecond Laser-Induced Mesoporous Structures on Silicon Surface

Curved Periodic Ripples Fabricated by Double Time-Delayed Femtosecond Laser Beams on the Silicon Surface.

Laser-induced self-organized periodic nano-hole/nano-ridge structures on the surface of silicon produced with a tightly focused femtosecond pulse laser beam

Controllable Si (100) Micro/nanostructures by Chemical-Etching-assisted Femtosecond Laser Single-Pulse Irradiation

Formation of Periodical Sub-Micron Sized Structures on Silicon by Interfered Nanosecond Laser Pulses

Periodic nanohole array structure induced on a silicon surface by direct writing with a femtosecond laser

Extremely Regular Periodic Surface Structures in a Large Area Efficiently Induced on Silicon by Temporally Shaped Femtosecond Laser

Sub-wavelength Ripple Formation on Silicon Induced by Femtosecond Laser Radiation

Fabrication of Microstructures on Silicon by Multiple Beam Holographic Method Using Nanosecond Laser Pulses

Highly Efficient Fabrication of Superhydrophilic Structures on Silicon Surface by the Interference of Two Femtosecond Laser Beams

Periodic Ripple Structures on Silicon Substrates Induced by Femtosecond Laser at Various Scan Modes

Silicon Three-Dimensional Structures Fabricated by Femtosecond Laser Modification with Dry Etching

Fabrication of Grating Structures on Silicon Carbide by Femtosecond Laser Irradiation and Wet Etching

Mechanism of Femtosecond-Laser-induced Periodic Nanostructure Formation on Crystalline Silicon Surface Immersed in Water

Formation of Array Microstructures on Silicon by Multibeam Interfered Femtosecond Laser Pulses

Femtosecond Laser Induced Surface Structuring on Silicon by Diffraction-Assisted Micropatterning

Femtosecond Laser-Induced Silicon Surface Morphology in Water