Abstract:Periodic micro/nano-structure has been playing an important role in microelectronics,microfluidics,micro/nano-optics.There are many technologies that have been proposed for structure manufacture,for example,photolithography,electron beam etching technique,nanoimprint technology.Although these technologies have their advantages,it is troubled by template production,corrosion solution and material choices.Multi-beam interference is one of the common technologies for fabrication of periodic structures as sacrificial layer.It is widely used for its easy setup,quick,and low cost capacities.Laser processing has the advantages of direct writing by light-absorbing under high energy density of pulsed laser of low costs,high quality,fine precision,non-fiat three dimensional fabrication ability in transparent medium.Herein,based on principle of interference lithography especially four-beam interference and laser ablation,we proposed one step method of fabrication of large-area mocro/nano-structures by multiple beam laser interference ablation technology.As we all know,light intensity would be redistributed and represent periodic strong and weak variation.Quanta-Ray Nd:YAG Laser of wavelength 355 nm,repetition of 10 Hz and pulse duration of 10 ns was used for laser interference ablation with maximum power 1100 mW and diameter of 10 mm.Area under high light intensity above the threshold will be ablated and removed,while area under low light intensity below the threshold will be left.Thus with this periodic intensity distribution in multiple beam interference and the ablation mechanism,two-dimensional periodic structures in large area can be fabricated maskless on zinc sulfide (ZnS) surface in one step.Additionally,the experiment is in normal atmosphere and donnot need vacuum,which makes it easy and low cost.Structure with period of 3 μtm at incident angle of 4.8° was chosen for example to investigate the transition of structure type,as well as the morphology evolution with exposure time in detail.While the incident angle of any beam is slightly changed,the two-dimensional distribution will break into two types,both of which have its own distribution.At the same time,these two types are distributed periodically.In our experiment,periodic holes and pillars were fabricated repeatedly on ZnS surface in the inte rference ablated area with a larger period about 74 μm.Periodic holes were of period 3 μm while pillars were of period 3 μm 1/√2.Distribution directions of pillars were 45° titled with that of holes.Further,the phenomenon of phase shift was studied by adjusting the incident angle of one beam in theory,which explained the experiment results well.At last,according to our study in recent years,the opportunity and challenge of multiple-beam interference ablation technology was discussed in this article.We are believed this interference ablation technology will be taking an important role in hard material processing,two dimensional periodic and quasi-periodic structure fabrication,OLED,solar cells and many more potential micro and nanotechnology regions.

Formation of Periodical Sub-Micron Sized Structures on Silicon by Interfered Nanosecond Laser Pulses

Direct Fabrication of Sub-micron Sized Mirco-structure by Interfering Nanosecond Laser Beams

Formation of Array Microstructures on Silicon by Multibeam Interfered Femtosecond Laser Pulses

Periodic nanohole array structure induced on a silicon surface by direct writing with a femtosecond laser

Fabrication of Microstructures on Silicon by Multiple Beam Holographic Method Using Nanosecond Laser Pulses

Sub-wavelength Ripple Formation on Silicon Induced by Femtosecond Laser Radiation

Formation of Laser-Induced Periodic Surface Nanometric Concentric Ring Structures on Silicon Surfaces Through Single-Spot Irradiation with Orthogonally Polarized Femtosecond Laser Double-Pulse Sequences

Periodic Structures Fabricated by Nanosecond Laser Four-Beam Interference Ablation

Generation of Periodic Micro- and Nano-Structures by Parameter-Controlled Three-Beam Laser Interference Technique

Deposition and Melting Behaviors for Formation of Micro/nano Structures from Nanostructures with Femtosecond Pulses

Direct Patterning of Periodic Semiconductor Nanostructures Using Single-Pulse Nanosecond Laser Interference

Laser-induced self-organized periodic nano-hole/nano-ridge structures on the surface of silicon produced with a tightly focused femtosecond pulse laser beam

Fabrication of Two-Dimensional Periodic Structures on Silicon after Scanning Irradiation with Femtosecond Laser Multi-Beams

Large Area Uniform Microstructures on Silicon Surface Created with a Picosecond Laser Beam Scanning

Periodic Microstructures Fabricated by Laser Interference with Subsequent Etching

Extremely Regular Periodic Surface Structures in a Large Area Efficiently Induced on Silicon by Temporally Shaped Femtosecond Laser

Deep Investigation of Two-Dimensional Structure Arrays Formed on Si Surface

Femtosecond Laser Induced Surface Structuring on Silicon by Diffraction-Assisted Micropatterning

Silicon micro-structuring using ultra-short laser pulses

The Fabrication Of Nanostructures On Polydimethylsiloxane By Laser Interference Lithography

Switchable Formation of Diverse Regular Nanostructures on Metal by Dual Correlated Femtosecond Laser Irradiations