Abstract:Femtosecond laser induced periodic surface structures (LIPSSs) have been implemented on various materials. However, its further development in manipulation of optical properties is hindered by the shallow depth. Herein, the paper proposes a novel method of two-step spatial-selective amorphization for producing the deep regular nanogratings on silicon by femtosecond laser and chemical etching with HF acid. In the first step, the spatially periodic amorphization of silicon surface is fabricated by the surface plasmon excitation of the incident femtosecond laser, the chemical etching of which produces the shallow gratings with a period of 765 nm, or so-called prefabricated-LIPSSs (pre-LIPSSs). During the second step, the spatial-selective amorphization of sample takes place by exploiting the local field enhancement of laser irradiation within the grooves. After chemical etching, the deep local field enhancement assisted LIPSSs (LFE-LIPSSs) are formed, with a three-fold larger depth of 155 nm but an invariable period. Comparing with the pre-LIPSSs, the LFE-LIPSSs show 45% increase in anti-reflection performance at around 700 nm and surface-enhanced Raman scattering (SERS) anisotropy ratio is increased about four times with 4-MBA molecules as probe molecules. This work provides a promising approach to fabricate deeper LIPSSs for more effectively controlling the optical properties of materials by femtosecond laser.

Fabrication of Microstructures on Silicon by Multiple Beam Holographic Method Using Nanosecond Laser Pulses

Formation of Periodical Sub-Micron Sized Structures on Silicon by Interfered Nanosecond Laser Pulses

Direct Fabrication of Sub-micron Sized Mirco-structure by Interfering Nanosecond Laser Beams

Deposition and Melting Behaviors for Formation of Micro/nano Structures from Nanostructures with Femtosecond Pulses

Formation of Array Microstructures on Silicon by Multibeam Interfered Femtosecond Laser Pulses

Fabrication of Two-Dimensional Periodic Structures on Silicon after Scanning Irradiation with Femtosecond Laser Multi-Beams

Fabrication of Micro-Grating Structure on Glazed Stainless-Steel by Two-Beam Holographic Method Using Nanosecond Laser Pulses

Highly Efficient Fabrication of Superhydrophilic Structures on Silicon Surface by the Interference of Two Femtosecond Laser Beams

Deepening of nanograting structures on Si by a two-step laser spatial-selective amorphization strategy combined with chemical etching

Fabrication of Nanostructures by Laser Optical Focusing

Femtosecond Laser-Induced Mesoporous Structures on Silicon Surface

Fabrication of Micro-grating Structures by Nanosecond Laser Ablation of Chrome Film on Glass Substrate

Controllable Si (100) Micro/nanostructures by Chemical-Etching-assisted Femtosecond Laser Single-Pulse Irradiation

Laser nano-fabrication inside silicon with spatial beam modulation and non-local seeding

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

High Quality Nanogratings Far Beyond Diffraction Limits on Silicon Efficiently Fabricated Using Femtosecond Laser Dual-Beam Interference Direct Writing

Laser nanofabrication inside silicon with spatial beam modulation and anisotropic seeding

Large Area Uniform Microstructures on Silicon Surface Created with a Picosecond Laser Beam Scanning

Silicon micro-structuring using ultra-short laser pulses

The Fabrication Of Nanostructures On Polydimethylsiloxane By Laser Interference Lithography

Hydrophobic Light-Trapping Structures Fabricated on Silicon Surfaces by Picosecond Laser Texturing and Chemical Etching