Abstract:At present, there are many problems such as high cost and high pollution in fabrication methods of anti-reflective structures on silicon surfaces. To solve this problem, the utilization of nanosecond pulse infrared laser processing technology is proposed to realize the fabrication of anti-reflective structures on silicon surfaces. Compared with polished silicon, the reflectance of the silicon surface with the anti-reflective structure can be reduced by 89% in the visible light band. In order to unfold the anti-reflection mechanism of the black silicon substrate and optimize the structures, finite difference time domain (FDTD) is adopted to simulate the anti-reflective conical structure with tunable aspect ratios and generate the corresponding reflectance spectrums. To optimize the aspect ratio of silicon surface structure, the processing parameters of nanosecond pulse infrared laser are investigated, which not only realizes the morphology control of the surface structure but also optimizes the anti-reflective performance of the silicon surface. The result shows that the reflectance of the silicon surface is reduced to 3.87% in the visible light band by the anti-reflective structure fabricated by nanosecond pulse infrared laser processing. Also, the variation of aspect ratio of the structure could be monitored and predicted by acoustic signal detection technique. This detection technique provides potential applications in structural integrity monitoring during the fabrication process.

Highly Efficient Fabrication of Superhydrophilic Structures on Silicon Surface by the Interference of Two Femtosecond Laser Beams

Hierarchical Micro/Nanostructures with Anti-Reflection and Superhydrophobicity on the Silicon Surface Fabricated by Femtosecond Laser

Superhydrophobic Dual Micro- And Nanostructures Fabricated By Direct Laser Interference Lithography

A Superhydrophilic Silicon Surface Enhanced by Multiscale Hierarchical Structures Fabricated by Laser Direct Writing

Superhydrophobic Surfaces Prepared by Microstructuring of Silicon Using a Femtosecond Laser.

Comparison of structures and hydrophobicity of femtosecond and nanosecond laser-etched surfaces on silicon

Fabrication of nano-scale superhydrophobic surfaces on silicon substrates using direct laser interference patterns(DLIP)

Preparation of Superhydrophobic Surface on Silicon Based on Laser Manufacturing and Self-Assembled Technique

Surface topography by water jet-guided laser texturing on wettability of monocrystalline silicon

Superhydrophobic Surfaces with Micro-/Nano-structures Prepared by Femtosecond Laser

Switchable Wettability of Silicon Micro-Nano Structures Surface Produced by Femtosecond Laser

Multi-scale Micro-Nano Structures Prepared by Laser Cleaning Assisted Laser Ablation for Broadband Ultralow Reflectivity Silicon Surfaces in Ambient Air

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

Time Dependency of Superhydrophilic and Superhydrophobic Surfaces Produced by Nanosecond Laser Irradiation Assisted by Post-Annealing and Silanization

Anti-reflection Silicon with Self-Cleaning Processed by Femtosecond Laser

Stable Superhydrophobic Surface with Hierarchical Mesh-Porous Structure Fabricated by A Femtosecond Laser

Fabrication of controllable wettability of crystalline silicon surfaces by laser surface texturing and silanization

Superhydrophobic silicon surfaces with micro-nano hierarchical structures via deep reactive ion etching and galvanic etching.

Periodic Silicon Surface Structures Fabricated by Infrared Nanosecond Pulse Laser Ablation in Ambient Air for Enhanced Anti-Reflection

Femtosecond Laser-Induced Mesoporous Structures on Silicon Surface

Controllable Si (100) Micro/nanostructures by Chemical-Etching-assisted Femtosecond Laser Single-Pulse Irradiation