Abstract:Searching for the relationship between the nanostructure and optical properties has always been exciting the researchers in the field of optics (linear optics as well as non-linear optics), energy harvesting (anti-reflective Si solar cells, perovskite solar cells, ..., etc.), and industry (anti-reflection coating on car windows, sunglasses, etc.). In this work, we present an approach for nanostructuring the silicon substrate to silicon photonic crystals. By precisely controlling the etching time and etching path after using nanoimprint lithography, ordered arrays of inverted Si nanopyramids and Si nanopillars with good homogeneity, uniform surface roughness, high reproducibility of pattern transfer, and a controllable aspect ratio are prepared. Experimental investigation of the optical properties indicates that the reflections of these Si nanostructures are mainly determined by the aspect ratio as well as the period of nanostructures. Furthermore, we have experimentally observed visible-light scattering (V-LS) patterns on inverted Si nanopyramids and Si nanopillars, and their corresponding patterns can be precisely controlled by the patterned nanostructures. The V-LS pattern, background, and "ghost peaks" on the angle-resolved scattering results are caused by constructive interference, destructive interference, and the interference situation between both. This controllable nanopatterning on crystalline Si substrates with precisely tunable optical properties shows great potential for applications in many fields, for example, optics, electronics, and energy.

Adaptive Synthesis of Optical Pattern for Photonic Crystal Lithography

Optical Lattices Engineered by Vector Polarization and Multisector Amplitude Modulation

Creating Anisotropic Topological Phases Within Inversely Designed Photonic Crystals

Phase Manipulated Multi-Beam Holographic Lithography for Tunable Optical Lattices

Controllable Two-Dimensional Photonic Crystal Patterns Fabricated by Nanosphere Lithography

Nanoscale multi-beam lithography of photonic crystals with ultrafast laser

Photonic Crystals: Light‐Patterned Crystallographic Direction of a Self‐Organized 3D Soft Photonic Crystal (adv. Mater. 42/2017)

Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system

Fabricate Planar Photonic Crystal Gradient Index Lens by Laser Interference Lithography

Patterning and pixelation of colloidal photonic crystals for addressable integrated photonics

Controllable Patterning of Metallic Photonic Crystals for Waveguide–Plasmon Interaction

Simulated calculation and design for fabricating three-dimensional photonic crystal structures using holographic lithography

High Speed Precise Refractive Index Modification for Photonic Chips through Phase Aberrated Pulsed Lasers

Fabrication Of Holographic Photonic Crystal Template With Back Incident Interference Beams

Photonic Crystal Structures Fabricated By Nanosphere Lithography

Self-organized Phase-Transition Lithography for All-Inorganic Photonic Textures.

Pinpoint Two-Photon Writing And Multi-Beam Interferential Patterning Of Three-Dimensional Polymer Photonic Crystals

Rewritable and Highly Stable Photonic Patterns for Optical Storage and Display Enabled by Direct-Pressure-programmed Shape Memory Photonic Crystals

Tailoring Patterned Visible-Light Scattering by Silicon Photonic Crystals

Two-Stage Design Method For Realization Of Photonic Bandgap Structures With Desired Symmetries By Interference Lithography

Efficient and Adaptive Reconfiguration of Light Structure in Optical Fibers with Programmable Silicon Photonics