Simulated calculation and design for fabricating three-dimensional photonic crystal structures using holographic lithography

Huan Liu,Jianquan Yao,Enbang Li
2004-01-01
Abstract:Photonic crystals are a new type of synthetic microstructure materials which have periodical refraction index variations and photonic band gaps. Different methods have been proposed and demonstrated to fabricate three-dimensional photonic crystal structures. Compared with the semiconductor and micromachining fabrication techniques, the holographic lithography method offers a number of advantages, including its ability to create large volume of periodic structures through one irradiation process, the uniformity of period, and the ease for controlling the structures. In this study, a multi-beam interference model, in which the beam intensities, polarization directions and phase delays are taken into consideration, is presented for predicting three-dimensional photonic crystal structures. The calculated results provide a useful guide for choosing proper optical parameters and photoresists to fabricate three-dimensional photonic crystal structures.
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