Two-Stage Design Method For Realization Of Photonic Bandgap Structures With Desired Symmetries By Interference Lithography

Xy Ao,Sl He
DOI: https://doi.org/10.1364/OPEX.12.000978
IF: 3.8
2004-01-01
Optics Express
Abstract:Interference lithography for the fabrication of photonic crystals is considered. A two-stage design method for realization of photonic bandgap structures with desired symmetries is developed. An optimal photonic crystal with a large bandgap is searched by adjusting some parameters while keeping some basic symmetry of the unit cell unchanged. A nonlinear programming method is then used to find the optimal electric field vectors of the laser beams and realize the desired interference pattern. The present method is useful for a rational and systematical design of new photonic bandgap structures. (C) 2004 Optical Society of America.
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