Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system

Hao Wu,Wei Hu,Huachao Hu,Xiaowen Lin,Ge Zhu,Jaewon Choi,Vladimir Grigorievich Chigrinov,Yanqing Lu
DOI: https://doi.org/10.1364/OE.20.016684
IF: 3.8
2012-01-01
Optics Express
Abstract:We propose and implement a technique for arbitrary pattern fabrication in liquid crystal (LC) alignments and local polarization control for light wavefront. A micro-lithography system with a digital micro-mirror device as dynamic mask forms arbitrary micro-images on photoalignment layers and further guides the LC molecule orientations. Besides normal phase gratings, more complex 2D patterns such as quasicrystal and checkerboard structures are demonstrated. To characterize the optical performances of the fabricated structures, the electro-optically tunable diffraction patterns and efficiencies are demonstrated in several 1D/2D phase gratings. Compared to other techniques, our method enables the arbitrary and instant manipulation of LC alignments and light polarization states, facilitating wide applications in display and photonic fields. (C) 2012 Optical Society of America
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