Applications of Dynamic Mask Based Photolithography in Liquid Crystal Alignment

HU Hua-chao,WEI Bing-yan,HU Wei,LU Yan-qing,胡华超 hu huachao,魏冰妍 wei bingyan,胡伟 hu wei,陆延青 lu yanqing
DOI: https://doi.org/10.3788/YJYXS20132802.0199
2013-01-01
Chinese Journal of Liquid Crystals and Displays
Abstract:A micro-lithography system based on digital micro-mirror device is utilized in liquid crystal(LC) alignments.The projected images on SD1 guide the SDI molecular orientations of the command layer,and further determine the directors of LC.Both complex pattern fabrication and arbitrary polarization control could be accomplished on this system with resolution up to 5 μm.Pattern transforming among different bar codes and subarea controlling of random gray scale have been demonstrated by means of the optical rewritability of SD1.These LC devices are switchable and tunable under applied fields.The dynamic LC photo-patterning technique may be widely used in information display and identification,tunable photonic devices,etc.
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