Abstract:Oxidative etching possesses an enriched flexibility and atomic-level accuracy in tailoring the size, morphology, surface structure, and composition of colloidal nanocrystals toward their catalytic and sensing applications. In this work, we choose one-dimensional penta-twinned Pd nanorods as a model system and apply liquid cell transmission electron microscopy (LCTEM) to investigate the detailed nanoscale etching process under different solution environments, which are DI water/e-beam (weakly oxidative), sodium chloride (NaCl) solution/e-beam (moderately oxidative), and ferric chloride (FeCl3) solution/e-beam (strongly oxidative), respectively. Increasing the oxidative strength of solution alone accelerates the dissolution kinetics and drives the system from the (near)-equilibrium etching, where nanorods appear in flat and low-indexed ends (for DI water/e-beam) to nonequilibrium etching with slender tips formed as intermediate products (for FeCl3/e-beam). Under a nonequilibrium etching condition, both symmetric and asymmetric etching occurred, that is, the penta-twinned structure either retained (for symmetric etching) or dissolved to a fourfold-, threefold-, and twofold-twinned and single-crystalline structure (for asymmetric etching), depending on the structural defects-induced strain distribution. The formation of slender tips of different structures can be further understood via energetic analysis and strain relaxation. In particular, in situ LCTEM results were successfully reproduced by flask system-based etching experiments; hence, direct correlations were built between LCTEM and conventional colloidal etching reactions. This work comprehends the present understanding on the synergetic roles of structure characteristics and solution chemistry for the etching of multiply twinned nanoparticles toward their precise controlled synthesis and practical applications.

Porosification-Induced Back-Bond Weakening in Chemical Etching of N-Si(111)

Synergy Between Structure Characteristics and the Solution Chemistry in a Near/Non-Equilibrium Oxidative Etching of Penta-Twinned Palladium Nanorods

Surface Structure Dependence of Mechanochemical Etching: Scanning Probe-Based Nanolithography Study on Si(100), Si(110), and Si(111)

Formation Mechanism of Heavily Doped Silicon Mesopores Induced by Pt Nanoparticle-Assisted Chemical Etching

A new theory for the anisotropic etching of silicon and some underdeveloped chemical micromachining concepts

Selective etching of n-type silicon in pn junction structure in hydrofluoric acid and its application in silicon nanowire fabrication.

Toward Controllable Wet Etching of Monocrystalline Silicon: Roles of Mechanically Driven Defects

Proximal probe-like nano structuring in metal-assisted etching of silicon

Metal-particle-induced, Highly Localized Site-Specific Etching of Si and Formation of Single-Crystalline Si Nanowires in Aqueous Fluoride Solution.

The formation of SiNWs depending on the topology of the metal-catalyst film in the process of metal-assisted chemical etching of c-Si

Research on Pt Nanoparticles-Assisted Chemical Etching of Heavily Doped p-Type Monocrystalline Silicon

Metal Ions' Dynamic Effect on Metal-Assisted Catalyzed Etching of Silicon in Acid Solution

Catalysis of Dispersed Silver Particles on Directional Etching of Silicon

Wafer-Scale Fabrication of Silicon Nanocones via Controlling Catalyst Evolution in All-Wet Metal-Assisted Chemical Etching

Orientation dependent etching of silicon by fluorine molecules: a quantum chemistry computational study

Research on Silicon Wafer Surface Phase under the Ultra-thin Slicing Process and Its Etching Hindrance Behavior during Metal-Assisted Chemical Etching

Formation of Cylindrical Nanoholes in Heavily Doped P-Type Si(100) Substrate Via Pt Nanoparticles-Assisted Chemical Etching

Optimization of Metal-Assisted Etchant Components for Fabrication of Porous Silicon

Self-Controlled Synthesis of Microscale Silicide Embossments and Pits with Multi-Shape and Orientation

Ultra-high aspect ratio Si nanowires fabricated with plasma etching: plasma processing, mechanical stability analysis against adhesion and capillary forces and oleophobicity

Fabrication of Single‐Crystalline Silicon Nanowires by Scratching a Silicon Surface with Catalytic Metal Particles