YBa2CU3O7-x THICK FILMS DEPOSITED BY PHOTO-ASSISTED METAL-ORGANIC CHEMICAL VAPOR DEPOSITION

JM Zeng,PC Chou,X Zhang,ZJ Tang,NJ Wu,A Molodyk,J Lian,LM Wang,A Ignatiev
DOI: https://doi.org/10.1142/s0217979205028712
2005-01-01
Abstract:High-quality Y Ba2Cu3O7-x (YBCO) thick films with thickness over 4.0 mu m were deposited by photo-assisted metal-organic chemical vapor deposition (PhA-MOCVD) technique with high growth rates. Microstructures of YBCO thick films have been systematically investigated by scanning electron microscopy, high-resolution transmission electron microscopy, and selected area electron diffraction techniques. The fabricated YBCO thick films are very dense and single-crystal like with no visible grain boundaries or voids. The high quality of the prepared YBCO thick films was confirmed further by the results of X-ray diffraction analyses and J(C) measurements. Thus, these thick YBCO films prepared by PhA-MOCVD technique have promising application potential in fields such as coated conductors.
What problem does this paper attempt to address?