Phase Change Random Access Memory Featuring Silicide Metal Contact And High-Kappa Interlayer For Operation Power Reduction

Lina Wei-Wei Fang,Rong Zhao,Kian-Guan Lim,Hongxin Yang,Luping Shi,Tow-Chong Chong,Yee-Chia Yeo
DOI: https://doi.org/10.1116/1.3584823
2011-01-01
Abstract:A phase change memory device integrated with a nickel monosilicide (NiSi) bottom electrode and a dielectric (Ta2O5) interlayer was investigated. The presence of a low thermal conductivity thin film between the bottom electrode and phase change layer promotes heating efficiency in the device. Reset voltages down to 2.2 and 1.86 V could be achieved for memory device without and with the Ta2O5 interlayer, respectively. In addition, low reset current of 0.66 mA and SET current of 0.2 mA were obtained for devices with Ta2O5 interlayer having a contact dimension of similar to 1 mu m. Endurance of the devices was also studied. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3584823]
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