Substrate Polarity and Surface Pretreatment Temperature Dependence of ZnO Homoepitaxy

Ran Gu,Kun Tang,Shulin Gu,Jiandong Ye,Shimin Huang,Zhengrong Yao,Shunming Zhu,Youdou Zheng
DOI: https://doi.org/10.1016/j.apsusc.2015.11.131
IF: 6.7
2015-01-01
Applied Surface Science
Abstract:We have grown ZnO films on Zn-polar and O-polar ZnO substrates pretreated at different temperature by metal-organic chemical vapor deposition. Generally, the Zn-polar samples have better structural and optical properties than the O-polar samples. We also found that the Zn-polar samples have a great performance on the suppression of the unintentionally doped carbon impurities. The sample grown on the 1000 degrees C-pretreated ZnO substrate has clearly showed a step-flow growth mode with the surface roughness as low as 2.654 nm, which could be regarded as the best growth condition. (C) 2015 Elsevier B.V. All rights reserved.
What problem does this paper attempt to address?