Extraction of micro-contact properties using a novel micromachined on-chip apparatus

Ben-Hwa Jang,Po-Hsun Tseng,Weileun Fang,Shin-Way Lin
DOI: https://doi.org/10.1109/EMAP.2008.4784284
2008-01-01
Abstract:In this paper we first demonstrated a micromachined device consisting of two chips to characterize the micro-contact properties, such as contact force, film resistance, constriction resistance, and contact surface roughness. Then, based on our unique circuit routing enabling parasitic resistance on chips to be eliminated, the film thickness, the effective contact area radius, and the Ohmic resistance and Sharvin resistance can be further analyzed. In addition, the two chips of the testing device can be disassembled and re-assembled, the interfacial properties can be therefore quantified at different contact cycles (N). Thus, both the qualitative and quantitative relationship among the interfacial properties can be investigated. To demonstrate the feasibility of the present apparatus, the contact characteristics of evaporated Al films were characterized. Potential applications of the present apparatus included a diagnostic tool for tribology and the performance enhancement for RF-MEMS switches and microconnectors.
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