Uv Photoconductors Based on Ga-Doped Zno Films

Mandalapu Leelaprasanna J.,Xiu Faxian,Yang Zheng,Liu Jianlin
DOI: https://doi.org/10.1557/proc-0891-ee08-07
2005-01-01
Abstract:Ga-doped n -type ZnO films were grown by molecular-beam epitaxy (MBE) on R-plane sapphire substrates. Material characterizations such as photoluminescence (PL), X-ray diffraction (XRD), secondary ion mass spectroscopy (SIMS) and Hall measurements were carried out to characterize the optical, structural, and electrical properties of the film. Photoconductor devices for ultraviolet (UV) light detection were fabricated by depositing Al (250 nm)/Ti (20 nm) ohmic metal contacts. Linear characteristics were obtained from current-voltage (I-V) measurements that showed response to UV and visible illumination. Voltage dependent photocurrent (PC) spectra and responsivity spectrum were obtained to characterize the detection capability of the device in the UV region.
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