Fabrication and Properties of ZnO Photoconductive UV Detector

叶志镇,张银珠,陈汉鸿,何乐年,邹璐,黄靖云,吕建国
DOI: https://doi.org/10.3321/j.issn:0372-2112.2003.11.002
2003-01-01
Tien Tzu Hsueh Pao/Acta Electronica Sinica
Abstract:Highly c-axis oriented ZnO thin films were deposited on single crystal Si(111) substrates by pulsed laser deposition (PLD). The photoconductive UV detectors based on ZnO thin films, being an MSM structure with interdigital (IDT)configuration, were fabricated by the desquamation photoetching method. The Al film-electrodes were deposited by planar magnetron sputtering. Results showed that the alloying temperature should be lower than 600°C. The I-V characteristic and the UV photoresponsivity of the detector were also investigated, indicating a good ohmic behavior between Al and ZnO thin film, a resistance about l00 KΩ for the detector, and a photoresponsivity of 0.5 A/W under ultraviolet illumination in ultraviolet region.
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