Abstract:Plasma Enhanced Chemical Vapour Deposition is an extremely versatile technique for directly growing multiwalled carbon nanotubes onto various substrates. We will demonstrate the deposition of vertically aligned nanotube arrays, sparsely or densely populated nanotube forests, and precisely patterned arrays of nanotubes. The high-aspect ratio nanotubes (~50 nm in diameter and 5 microns long) produced are metallic in nature and direct contact electrical measurements reveal that each nanotube has a current carrying capacity of 10 7 -10 8 A/cm 2 , making them excellent candidates as field emission sources. We examined the field emission characteristics of dense nanotube forests as well as sparse nanotube forests and found that the sparse forests had significantly lower turn-on fields and higher emission currents. This is due to a reduction in the field enhancement of the nanotubes due to electric field shielding from adjacent nanotubes in the dense nanotube arrays. We thus fabricated a uniform array of single nanotubes to attempt to overcome these issues and will present the field emission characteristics of this.

Effect of Hydrogen Plasma Treatment on Uniformity of Field Emission from Carbon Nanotube Film

Field Emission Characteristics of Screen-Printed Carbon Nanotubes Cold Cathode by Hydrogen Plasma Treatment

Effect of Hydrogen Treatment on the Field Emission of Amorphous Carbon Film

On Achieving Better Uniform Carbon Nanotube Field Emission by Electrical Treatment and the Underlying Mechanism

Enhanced Field Emission from Carbon Nanotube Films by Hydrogen Glow Discharge Treatment

Achieving Uniform Field Emission from Carbon Nanotube Composite Cold Cathode with Different Carbon Nanotube Contents: Effects of Conductance and Plasma Treatment

Plasma Composition During Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanotubes

Plasma Enhanced Chemical Vapour Deposition Carbon Nanotubes/Nanofibres - How Uniform Do They Grow?

Study on effect of hydrogen treatment on amorphous carbon film using scanning probe microscopy

Plasma etching treatment for improving the field emission properties of carbon nanotubes composite emitters

Effect of Surface Treatment on Printed Carbon Nanotube Field Emitters

The effect of hydrogen plasma chemical annealing on electron field emission of amorphous carbon films

Super-low Turn-on and Threshold Electric Fields of Plasma-Treated Partly Fe-filled Carbon Nanotube Films

Hydrogenation and Hydro-Carbonation and Etching of Single-Walled Carbon Nanotubes

Improvement of electron field emission from amorphous carbon films due to hydrogen plasma chemical annealing effect

Field Emission From Short And Stubby Vertically Aligned Carbon Nanotubes

Effects of Plasma and Acid Treatment on the Dispersion of Carbon Nanotubes in Liquids

Plasma Enhanced Chemical Vapour Deposited Carbon Nanotubes for Field Emission Applications

Hydrogenation and Hydrocarbonation and Etching of Single-Walled Carbon Nanotubes.

Plasma etching carbon nanotube arrays and the field emission properties

Improving Field Emission Properties of Carbon Nanotubes Film by High-Temperature Sintering and Plasma Bombarding