Abstract:This paper investigates the consequence of the material property and the plasma gas chemistry (herein referred to the plasma gas-feeding species and methods) on the electrode performance in plasma treatments of screen-printed carbon nanotube (CNT) films. Four plasma gases (Ar, O2, SF6, and CHF3) and three gas-feeding methods were examined. The surface morphology, microstructure, and composition of 11 sample groups have been carefully characterized. Tests of the CNT film electrode subjected to gas discharge and field emission show that surface morphology modification is the most influential factor in respect of lowering the onset voltages. In detail, O2/Ar (O2 followed by Ar) and Ar+CHF3+SF6 (mixed three gases) treatments are the best choices for ionization and field emission applications, respectively. The relevant results are even better than that of the samples of aligned CNT films prepared by chemical vapor deposition. The underlying mechanisms are modeled by two opposing processes (etching and coating), which phenomenally produce three competing effects, i.e., CNT protruding, bundle forming, and neo-nanostructure forming. The results and the correct behavior of our model suggest that the plasma gas chemistry is the most fundamental factor in the process of plasma treatments of CNT films.

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Enhanced Field Emission from Carbon Nanotubes by Electroplating of Silver Nanoparticles

Plasma etching treatment for improving the field emission properties of carbon nanotubes composite emitters

A Novel Mechanical Approach to Improve the Field Emission Characteristics of Printed CNT Films

Post-treatment of screen-printed carbon nanotube emitter by selective plasma etching

Achieving Uniform Field Emission from Carbon Nanotube Composite Cold Cathode with Different Carbon Nanotube Contents: Effects of Conductance and Plasma Treatment

Effects of plasma treatment on microstructure and electron field emission properties of screen-printed carbon nanotube films

Effect of Ion Impinging on the Microstructure and Field Emission of Carbon Nanotubes

Post Treatment of Screen-Printed Carbon Nanotubes Emitter by Plasma Etching

SURFACE MODIFICATION OF PRINTED CARBON NANOTUBES AND ITS APPLICATION OF FIELD EMISSION

Ar, O2, CHF3, and SF6 plasma treatments of screen-printed carbon nanotube films for electrode applications

Comparison on Different Post-treatment Methods of Printed Carbon Nanotube Films for Enhanced Field Emission

Effect of Surface Treatment on Printed Carbon Nanotube Field Emitters

Thermal-assisted field emission from carbon nanotube cathode

Improvement of Luminescent Stability from Carbon Nanotube Field Emission Display Based on Printed CNT Film

Preparation by a Low Temperature Method and the Field Emission Properties of Carbon Nanotube Cold Cathodes

Fabrication Of Field Emission Cathode By Spraying Multiwalled Carbon Nanotubes On Screen Printed Substrate

Mechanical Fabrication of Carbon Nanotube Films and Their Field-Emission Properties

Super-low Turn-on and Threshold Electric Fields of Plasma-Treated Partly Fe-filled Carbon Nanotube Films