Abstract:Plasma-enhanced chemical vapor deposition (PECVD) is a versatile technique for growing well-aligned, precisely patterned, multiwalled carbon nanotubes directly on substrates. We report on the characterization of PECVD deposited nanotubes using Auger Electron Spectroscopy (AES); we believe that this is the first comprehensive AES study of nanotubes and the effect of the deposition process on the substrate. The nanotubes contained well-crystallized graphitic carbon, in contrast to the amorphous/disordered carbon byproduct which is condensed on the substrate surface. By adjusting the deposition gas ratios, we show, using depth-profiled composition analysis, that it is possible to eliminate the unwanted amorphous carbon on the substrate surface. However, a 5 nm interfacial layer, which contained the plasma species, was always present on the substrate surface due to its exposure to the plasma. We could prevent the formation of this interfacial layer by shielding areas of the substrate from the plasma to achieve truly byproduct free deposition. This technique has allowed us to fabricate promising microelectronic field emission devices using vertically aligned carbon nanotubes.

Post Treatment of Screen-Printed Carbon Nanotubes Emitter by Plasma Etching

Post-treatment of screen-printed carbon nanotube emitter by selective plasma etching

Plasma etching treatment for improving the field emission properties of carbon nanotubes composite emitters

Effect of Surface Treatment on Printed Carbon Nanotube Field Emitters

Field Emission Characteristics of Screen-Printed Carbon Nanotubes Cold Cathode by Hydrogen Plasma Treatment

Improving Field Emission Properties of Carbon Nanotubes Film by High-Temperature Sintering and Plasma Bombarding

Improvement of the Field Emission from Screen Printed Carbon Nanotube Cold Cathode by Applying Electrical Field

The Enhanced Field-Emission Properties of Screen-Printed Single-Wall Carbon-Nanotube Film by Electrostatic Field

Plasma etching carbon nanotube arrays and the field emission properties

Effect of Ion Beam Etching on the Field Emission of Carbon Nanotube Arrays

Achieving Uniform Field Emission from Carbon Nanotube Composite Cold Cathode with Different Carbon Nanotube Contents: Effects of Conductance and Plasma Treatment

Enhanced Field Emission from Carbon Nanotubes by Electroplating of Silver Nanoparticles

Outstanding Field Emission Properties Of Wet-Processed Titanium Dioxide Coated Carbon Nanotube Based Field Emission Devices

Surface Engineering for an Enhanced Photoelectrochemical Response of TiO2 Nanotube Arrays by Simple Surface Air Plasma Treatment.

Fabrication Of Field Emission Cathode By Spraying Multiwalled Carbon Nanotubes On Screen Printed Substrate

Characterization of Plasma-Enhanced Chemical Vapor Deposition Carbon Nanotubes by Auger Electron Spectroscopy

Effect of Hydrogen Plasma Treatment on Uniformity of Field Emission from Carbon Nanotube Film

Plasma Enhanced Chemical Vapour Deposited Carbon Nanotubes for Field Emission Applications

Damages of screen-printed carbon nanotube cold cathode during the field emission process

Growth of Aligned Multiwall Carbon Nanotubes and the Effect of Adsorbates on the Field Emission Properties

Super-low Turn-on and Threshold Electric Fields of Plasma-Treated Partly Fe-filled Carbon Nanotube Films