Plasma etching carbon nanotube arrays and the field emission properties

Yuming Liu,Liang Liu,Peng Liu,Leimei Sheng,Shoushan Fan
DOI: https://doi.org/10.1016/j.diamond.2004.01.014
IF: 3.806
2004-01-01
Diamond and Related Materials
Abstract:We study the morphologies and the field emission properties of carbon nanotube (CNT) arrays grown on silicon substrate before and after Ar and O2 plasmas etching. The CNT arrays are synthesized by chemical vapor deposition of ethylene and argon gases in the presence of iron catalysts. Plasma etching is carried out in a DC magnetron-sputtering apparatus. After the treatment, a novel structure of needle-shaped bundles on the surface of CNT arrays is obtained, whose morphologies will be quite different under varied conditions. Enhanced field emission properties are observed after proper treatment.
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