Plasma etching treatment for improving the field emission properties of carbon nanotubes composite emitters

hao ren,s z deng,jun chen,j c she,n s xu

DOI: https://doi.org/10.1109/IVMC.2003.1223083

2003-01-01

Abstract:In this report, we introduce an ion reactive plasma etching treatment to modify the field emission properties of screen-printed CNT thick film field emitters. The surface morphology was examined using scanning electron microscopy.

What problem does this paper attempt to address?

Post Treatment of Screen-Printed Carbon Nanotubes Emitter by Plasma Etching

Jun Yu,Jun Chen,Shaozhi Deng,Ningsheng Xu

DOI: https://doi.org/10.1109/IVNC.2006.335220

2006-01-01

Abstract:The effect of post-deposition plasma etching on the field emission properties of screen-printed multiwalled carbon nanotube electron emitter arrays is investigated. Results prove that short time etching can effectively remove parts of the inorganic binder, aligns the carbon nanotubes and improve field emission properties
Field Emission Characteristics of Screen-Printed Carbon Nanotubes Cold Cathode by Hydrogen Plasma Treatment

Jun Yu,Jun Chen,S. Z. Deng,N. S. Xu

DOI: https://doi.org/10.1016/j.apsusc.2011.08.027

IF: 6.7

2011-01-01

Applied Surface Science

Abstract:Selective plasma etching and hydrogen plasma treatment were introduced in turn to improve field emission characteristics of screen-printed carbon nanotubes (CNTs) cold cathode, which was prepared by using slurry of mixture of multi-wall CNTs, organic vehicles and inorganic binder, i.e. silicon dioxide sol. The results show that selective plasma etching process could effectively remove parts of surface inorganic vehicle (SiO2) layer and expose more smooth and clean CNTs on cathode surface, which could significantly decrease the operating field of CNTs cathode. There are some nanoparticles emerging on the out of CNTs wall after hydrogen plasma treatment, which are equivalent to increase field emission point of cathode. At the same time, these nanoparticles can increase the local electric field of CNTs, which can decrease operating voltage of CNTs cathode and improve uniformity field emission.
Effect of Surface Treatment on Printed Carbon Nanotube Field Emitters

H Ren,Sz Deng,J Chen,Jc She,Ns Xu

DOI: https://doi.org/10.1002/sia.1723

2004-01-01

Surface and Interface Analysis

Abstract:The effects of different surface treatments on printed carbon nanotube thick-film field emitters are described. Surface treatments using chemical etching and physical plasma etching techniques were purposely developed. The surface morphology and field emission properties of the carbon nanotube emitters after different surface treatments were characterized. It was found that the etching processes can effectively improve the field emission property through increasing the extent of protrusion of carbon nanotubes out of the surface of emitters, resulting in an increase in the field enhancement factor beta. Copyright (C) 2004 John Wiley Sons, Ltd.
Post-treatment of screen-printed carbon nanotube emitter by selective plasma etching

Jun Yu,Jun Chen,S. Z. Deng,J. C. She,N. S. Xu

DOI: https://doi.org/10.1116/1.2429666

2007-01-01

Abstract:Screen-printed carbon nanotube (CNT) emitter arrays were prepared by using slurry of mixture of multiwall CNTs, organic vehicles, and inorganic binder, i.e., silicon dioxide sol. The composition of the slurry was optimized by varying the CNT content in the mixture. It was found that only the cathode with appropriate, CNT contents had low turn-on field and high emission current density. A post-treatment process was introduced to further improve the field emission properties which selectively etches away the silicon dioxide binder by inductively coupled plasma etching. The results show that the selective etching process could effectively remove the inorganic binder layer from screen-printing CNT emitters and improve field emission performances. (c) 2007 American Vacuum Society.
Improving Field Emission Properties of Carbon Nanotubes Film by High-Temperature Sintering and Plasma Bombarding

L. Xin

Abstract:To solve the problems of field emission capability and short lifetime of screen-printing carbon nanotube(CNT) thin film cathode,a novel post-treatment with high-temperature sintering and plasma bombarding is presented.Compared with existing methods,the treatment can clean the organic bonds on CNT thin film surface perfectly,improve the contact between CNTs and silver electrode effectively and burn the excessively protruded CNT tips without mechanical damage.The field emission tests indicate that,the turn on electric field of the treated CNT thin film cathode is 2.6 V/μm and the current density reaches 527×10-6 A/cm2 at the electric field of 9.0 V/μm.The lifetime test reveals that the current degeneration is not found after 200 minutes lighting and the current fluctuation is small.The proposed posttreatment promises the feasibility of enhancing the field emission of screen-printed CNT thin film cathode.

Materials Science,Engineering,Physics
Plasma etching carbon nanotube arrays and the field emission properties

Yuming Liu,Liang Liu,Peng Liu,Leimei Sheng,Shoushan Fan

DOI: https://doi.org/10.1016/j.diamond.2004.01.014

IF: 3.806

2004-01-01

Diamond and Related Materials

Abstract:We study the morphologies and the field emission properties of carbon nanotube (CNT) arrays grown on silicon substrate before and after Ar and O2 plasmas etching. The CNT arrays are synthesized by chemical vapor deposition of ethylene and argon gases in the presence of iron catalysts. Plasma etching is carried out in a DC magnetron-sputtering apparatus. After the treatment, a novel structure of needle-shaped bundles on the surface of CNT arrays is obtained, whose morphologies will be quite different under varied conditions. Enhanced field emission properties are observed after proper treatment.
Achieving Uniform Field Emission from Carbon Nanotube Composite Cold Cathode with Different Carbon Nanotube Contents: Effects of Conductance and Plasma Treatment

J. B. Liu,Jun Chen,N. S. Xu,S. Z. Deng,J. C. She

DOI: https://doi.org/10.1016/j.ultramic.2008.11.001

IF: 2.994

2009-01-01

Ultramicroscopy

Abstract:A carbon nanotube (CNT) composite cold cathode was studied for field emission display application. The CNT composite cold cathode was composed of CNTs and silicon dioxide binder. Field emission from CNT composite cold cathode with different CNT contents was studied. It was found that with increase in CNT contents, the threshold field decreased. The conductance of the composite cathode was measured and with increasing CNT content, there was a critical CNT content where the conductance increased several orders of magnitude. Plasma etching using SF(6) as the etchant was adopted to treat the cathode. Improvement in emission uniformity was achieved. It was also found that after post-treatment the threshold field of the cathode decreased. The morphology of the etched cathode was analyzed and the improvement of uniformity and lowering of the threshold field was attributed to the exposure of CNTs after etching.
Improvement of the Field Emission from Screen Printed Carbon Nanotube Cold Cathode by Applying Electrical Field

Geng Zhang,Jun Chen,Deng, S.Z.,Xu, N.S.

DOI: https://doi.org/10.1109/ivnc.2006.335216

2006-01-01

Abstract:The effects of field emission cycles applied on the screen printed carbon nanotube (CNT) cold cathode were studied. CNT emitters were vertically well aligned and the emission images were visibly improved after the field treatment. The mechanism of the treatment was investigated using scanning electron microscopy. The mechanism may involve the erasion of hot spot and alignment of CNT
Super-low Turn-on and Threshold Electric Fields of Plasma-Treated Partly Fe-filled Carbon Nanotube Films

Xuchun Gui,Jinquan Wei,Kunlin Wang,Eryang Xu,Ruitao Lv,Dan Zhu,Zhigang Guo,Feiyu Kang,Yanqiu Zhu,Dejie Li,Hongwei Zhu,Dehai Wu

DOI: https://doi.org/10.1016/j.materresbull.2010.01.015

IF: 5.6

2010-01-01

Materials Research Bulletin

Abstract:Field emission properties of partly Fe-filled carbon nanotubes (FCNTs) treated with different plasmas have been studied. Super low turn-on (0.24V/μm) and threshold (0.6V/μm) electric fields are identified upon nitrogen plasma treatment for 60min. The field-enhancement factor, as high as 4.8×104, can be attributed to the plasma-induced structural defects and the unique characteristics of thin walled FCNTs with filled Fe nanowires. A model has been proposed to understand the effects of plasma on the CNTs.
Enhanced Field Emission from Carbon Nanotubes by Electroplating of Silver Nanoparticles

Leifeng Chen,Yuhong Mi,Hualiang Ni,Zhenguo Ji,Junhua Xi,Xiaodong Pi,Haifeng Zhao

DOI: https://doi.org/10.1116/1.3610841

2011-01-01

Abstract:The authors report that the field emission of carbon nanotubes (CNTs) is significantly improved by electroplating. The electroplating leads to a decrease of the turn-on electric field from 2.95 to 1.0 V/μm and an increase of the emission-current density from 0.224 to 0.8112 mA/cm2 at an applied electric field of 8 V/μm. It is found that after 23 days the current density of the CNT emitters prepared with electroplating only decreases by 10%, whereas that of the CNT emitters prepared without electroplating decreases by more than 80%. The improvement of the field emission of CNTs is due to the electroplating-enabled strong adhesion between the CNTs and the substrate. This has been verified by the measurement of the contact resistance.
Effect of Hydrogen Plasma Treatment on Uniformity of Field Emission from Carbon Nanotube Film

XH Liang,J Chen,SZ Deng,NS Xu

DOI: https://doi.org/10.1109/ivmc.2003.1223084

2003-01-01

Abstract:Summary form only given. The effect of surface treatment by hydrogen plasma treatment on the uniformity field emission from carbon nanotube (CNT) film will be studied. The CNT film was prepared by using thermal vapour deposition (CVD) on Ni-Cr/Si. The surface of as-grown CNT film will be treated by reactive ion etch (RIE) system in hydrogen plasma. In order to compare the microstructure of untreated CNT film with treated CNT film, scanning electron microscopy and transmission electron microscopy will be employed. The I-V characteristics and uniformity of field emission of both the untreated and treated CNT film will be measured in ultra-high vacuum by using transparent anode technique. The I-V and uniformity of field emission of the CNT film will be compared before and after hydrogen plasma treatment. The mechanism for the observed effect will be investigated.
Field emission from Nanocomposite Carbon

g a j amaratunga,i alexandrou,n l rupesinghe,m chhowalla,christopher j kiely

DOI: https://doi.org/10.1007/978-94-010-0858-7_15

2001-01-01

Abstract:A carbon arc with a local N2 gas jet is used to deposit a new form of nanocomposite carbon films. The films are comprised of a semiconducting carbon matrix with nanoscale graphitic particles embedded within it. These nanoscale particles have a closed form structure similar to short carbon nanotubes. The field emission properties of these films are reported. A threshold electric field of 3.8 V/μm at 1 nA are measured. After a short wet etch, the measured threshold field reduces to 2.6 V/μm. The emission characteristics of the etched nanocomposite films are very close to those of films made up from randomly oriented nanotubes obtained by drying of a suspension. The unetched nanocomposite films give a more stable emission characteristic. A model which involves emission of electrons from subsurface nanoparticles into the semiconducting a-C matrix, and emission from a-C into vacuum is proposed. This type of film combines the advantages of carbon nanotube field emission with those of plasma based thin film deposition technology. There is a small lowering of the emission current, but the emission stability is greatly improved.
Plasma Enhanced Chemical Vapour Deposited Carbon Nanotubes for Field Emission Applications

Teo K. B. K.,Pirio G.,Lee S. B.,Chhowalla M.,Legagneux P.,Nedellec Y.,Hasko D. G.,Ahmed H.,Pribat D.,Amaratunga G. A. J.,Milne W. I.

DOI: https://doi.org/10.1557/proc-706-z5.9.1

2001-01-01

MRS Proceedings

Abstract:Plasma Enhanced Chemical Vapour Deposition is an extremely versatile technique for directly growing multiwalled carbon nanotubes onto various substrates. We will demonstrate the deposition of vertically aligned nanotube arrays, sparsely or densely populated nanotube forests, and precisely patterned arrays of nanotubes. The high-aspect ratio nanotubes (~50 nm in diameter and 5 microns long) produced are metallic in nature and direct contact electrical measurements reveal that each nanotube has a current carrying capacity of 10 7 -10 8 A/cm 2 , making them excellent candidates as field emission sources. We examined the field emission characteristics of dense nanotube forests as well as sparse nanotube forests and found that the sparse forests had significantly lower turn-on fields and higher emission currents. This is due to a reduction in the field enhancement of the nanotubes due to electric field shielding from adjacent nanotubes in the dense nanotube arrays. We thus fabricated a uniform array of single nanotubes to attempt to overcome these issues and will present the field emission characteristics of this.
Effect of Ion Beam Etching on the Field Emission of Carbon Nanotube Arrays

Xihong Chen,Yongqin Chang,Zhe Wang,Dapeng Yu

DOI: https://doi.org/10.1016/j.ssc.2009.01.011

IF: 1.934

2009-01-01

Solid State Communications

Abstract:Vertically aligned carbon nanotube (CNT) arrays were synthesized on a silicon substrate via vaporization of ethylene (C2H4) using a hot-filament chemical vapor deposition (HF-CVD) method. The as-grown arrays were etched using a dual ion mill and the field emission properties of the CNTs before and after etching were studied. It was found that the structure of the emitter tips and the morphology of the CNT arrays influenced the field amplification factor (β) which is an important parameter for the field emission properties. SEM and TEM analyses indicated that the changes in the macroscopic morphology of the CNT array and structure of the CNT tips were responsible for the improvement in emission after 10 min etching.
Outstanding Field Emission Properties Of Wet-Processed Titanium Dioxide Coated Carbon Nanotube Based Field Emission Devices

jinzhuo xu,peng xu,wei ouyang,xiaohong chen,pingsheng guo,jun li,xianqing piao,miao wang,zhuo sun

DOI: https://doi.org/10.1063/1.4909552

IF: 4

2015-01-01

Applied Physics Letters

Abstract:Field emission devices using a wet-processed composite cathode of carbon nanotube films coated with titanium dioxide exhibit outstanding field emission characteristics, including ultralow turn on field of 0.383V mu m(-1) and threshold field of 0.657V mu m(-1) corresponding with a very high field enhancement factor of 20 000, exceptional current stability, and excellent emission uniformity. The improved field emission properties are attributed to the enhanced edge effect simultaneously with the reduced screening effect, and the lowered work function of the composite cathode. In addition, the highly stable electron emission is found due to the presence of titanium dioxide nanoparticles on the carbon nanotubes, which prohibits the cathode from the influence of ions and free radical created in the emission process as well as residual oxygen gas in the device. The high-performance solution-processed composite cathode demonstrates great potential application in vacuum electronic devices. (C) 2015 AIP Publishing LLC.
Effect of Hydrogen Treatment on the Field Emission of Amorphous Carbon Film

W. G. Xie,Jun Chen,Jian Chen,S. Z. Deng,J. C. She,N. S. Xu

DOI: https://doi.org/10.1063/1.2724426

IF: 2.877

2007-01-01

Journal of Applied Physics

Abstract:The field emission characteristics of amorphous carbon (a-C) films are studied before and after H plasma treatment. It is found that H plasma treatment lowered the turn-on field and improved the field emission uniformity. Surface sp2∕sp3 ratio, work function, and topography of the a-C films before and after H plasma treatment are studied using Raman spectroscopy, Kelvin probe, and atomic force microscopy, respectively. The results show that the etching effect of H plasma on a-C film is obvious, which is different from those of diamond and tetrahedral amorphous carbon (ta-C) films. We suggest that the surface component change and nanostructure of treated a-C films cause electron injection from sp2 sites to surface sp3 sites which are responsible for low macroelectrical field emission.
Improved Emission Stability of Hfc-Coated Carbon Nanotubes Field Emitters

J Jiang,JH Zhang,T Feng,BY Jiang,YJ Wang,FM Zhang,LJ Dai,X Wang,XH Liu,SC Zou

DOI: https://doi.org/10.1016/j.ssc.2005.05.018

IF: 1.934

2005-01-01

Solid State Communications

Abstract:Plasma-enhanced chemical vapor deposition (PECVD) method was employed to synthesize the Fe-catalyzed carbon nanotubes (CNTs). Hf films were deposited onto the synthesized CNTs, followed by heat treatment at 1200°C which could form HfC. Field emission properties indicate that the HfC-coated CNTs have good emission current density due to low work function of HfC and also keep stable emission characteristics under poor vacuum owing to the chemical inertness of HfC. Consequently, field emission characteristics of the CNTs can be improved by the HfC-coated surface treatment compared with the synthesized CNTs.
The Enhanced Field-Emission Properties of Screen-Printed Single-Wall Carbon-Nanotube Film by Electrostatic Field

X. F. Shang,J. J. Zhou,P. Zhao,Z. H. Li,S. Qu,Z. Q. Gu,Y. B. Xu,M. Wang

DOI: https://doi.org/10.1016/j.apsusc.2009.09.036

IF: 6.7

2010-01-01

Applied Surface Science

Abstract:In this work, we improved the field-emission properties of a screen-printed single-wall carbon-nanotube (SWCNT) film by applying a strong electrostatic field during the drying process after the printing. By applying the strong field, more tips of SWCNTs could emerge from the screen-printed film and turn somewhat toward the erecting direction because of the repulsive force among the SWCNTs. The field-emission properties of the film were thus improved obviously. The improved field emitters sample has low electron emission turn-on field (Eto=1.22V/μm), low electron emission threshold field (Eth=2.32V/μm) and high brightness with good uniformity and stability. The lowest operating field of the improved sample is below 1.0V/μm and its optimum current density exceeds 3.5mA/cm2.
Plasma Composition During Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanotubes

MS Bell,RG Lacerda,KBK Teo,NL Rupesinghe,GAJ Amaratunga,WI Milne,M Chhowalla

DOI: https://doi.org/10.1063/1.1782256

IF: 4

2004-01-01

Applied Physics Letters

Abstract:Neutral species and positive ions were extracted directly from a C2H2:NH3 plasma used to grow vertically aligned carbon nanotubes (CNTs) and analyzed by mass spectrometry. We observe that NH3 suppresses C2H2 decomposition and encourages CNT formation. We show that the removal of excess carbon, essential for obtaining nanotubes without amorphous carbon deposits, is achieved through gas phase reactions which form mainly HCN. We determine an optimum C2H2:NH3 gas ratio which is consistent with previous observations based upon postdeposition analysis. We find, in contrast to thin film growth by plasma-enhanced chemical vapor deposition, that the optimum condition does not correspond to the highest level of ionization. We also provide evidence that C2H2 is the dominant precursor for CNTs in our experiments.
Field Emission Properties of Nanocomposite Carbon Nitride Films

I Alexandrou,M Baxendale,NL Rupesinghe,GAJ Amaratunga,CJ Kiely

DOI: https://doi.org/10.1116/1.1322043

2000-01-01

Abstract:A modified cathodic arc technique has been used to deposit carbon nitride thin films directly on n+ Si substrates. Transmission Electron Microscopy showed that clusters of fullerene-like nanoparticles are embedded in the deposited material. Field emission in vacuum from as-grown films starts at an electric field strength of 3.8 V/micron. When the films were etched in an HF:NH4F solution for ten minutes, the threshold field decreased to 2.6 V/micron. The role of the carbon nanoparticles in the field emission process and the influence of the chemical etching treatment are discussed.

Plasma etching treatment for improving the field emission properties of carbon nanotubes composite emitters

Post Treatment of Screen-Printed Carbon Nanotubes Emitter by Plasma Etching

Field Emission Characteristics of Screen-Printed Carbon Nanotubes Cold Cathode by Hydrogen Plasma Treatment

Effect of Surface Treatment on Printed Carbon Nanotube Field Emitters

Post-treatment of screen-printed carbon nanotube emitter by selective plasma etching

Improving Field Emission Properties of Carbon Nanotubes Film by High-Temperature Sintering and Plasma Bombarding

Plasma etching carbon nanotube arrays and the field emission properties

Achieving Uniform Field Emission from Carbon Nanotube Composite Cold Cathode with Different Carbon Nanotube Contents: Effects of Conductance and Plasma Treatment

Improvement of the Field Emission from Screen Printed Carbon Nanotube Cold Cathode by Applying Electrical Field

Super-low Turn-on and Threshold Electric Fields of Plasma-Treated Partly Fe-filled Carbon Nanotube Films

Enhanced Field Emission from Carbon Nanotubes by Electroplating of Silver Nanoparticles

Effect of Hydrogen Plasma Treatment on Uniformity of Field Emission from Carbon Nanotube Film

Field emission from Nanocomposite Carbon

Plasma Enhanced Chemical Vapour Deposited Carbon Nanotubes for Field Emission Applications

Effect of Ion Beam Etching on the Field Emission of Carbon Nanotube Arrays

Outstanding Field Emission Properties Of Wet-Processed Titanium Dioxide Coated Carbon Nanotube Based Field Emission Devices

Effect of Hydrogen Treatment on the Field Emission of Amorphous Carbon Film

Improved Emission Stability of Hfc-Coated Carbon Nanotubes Field Emitters

The Enhanced Field-Emission Properties of Screen-Printed Single-Wall Carbon-Nanotube Film by Electrostatic Field

Plasma Composition During Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanotubes

Field Emission Properties of Nanocomposite Carbon Nitride Films