Development of High Critical Current YBCO Coated Conductors by Photo-Assisted MOCVD

Chen Yimin,Chen Xin,Tang Zhongjia,Chou PenChu,Zhang Xin,Ignatiev Alex
DOI: https://doi.org/10.1557/proc-659-ii4.3
2000-01-01
MRS Proceedings
Abstract:YBa 2 Cu 3 O 7 (YBCO) films have been deposited by photo-assisted MOCVD at rates of greater than 0.3μm/min on both single crystal oxide substrates and atomically textured metallic substrates. The YBCO films of thickness from 0.5μm to 3μm deposited on LaAlO 3 substrates are shown to be highly atomically ordered with J c > 1 × 10 6 A/cm 2 . CeO 2 buffer layers have also been developed by photo-assisted MOCVD for the integration of YBCO with metallic substrates. The CeO 2 layers were found to be crack-free when grown on nickel even above 1 micron thickness, and exhibited crystal orientation and in-plane alignment similar to that of the atomically textured Ni substrates. YBCO films grown on the thick CeO 2 buffer layers on nickel substrates have shown promising results with J c ∼6 × 10 5 A/cm 2 .
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