High-Density Gate Aperture Arrays For Mo-Feas Fabricated By Electron Beam Lithography

fei yan,nannan li,lei chen,dazhi jin,wei xiang
DOI: https://doi.org/10.1109/ivec.2015.7223901
2015-01-01
Abstract:Electron sources are of great importance for the operation of the microwave devices. High-density field emitter arrays (FEA) can be used as electron sources for microwave devices with frequencies extending into the THz. In this work, we report on the successful application of electron beam lithography for fabricating the high-density gate aperture arrays for Mo-FEAs. We demonstrate gate aperture arrays with sub-micron pitch and density up to 10(8) tips / cm(2). The results can provide useful information for the application of field emitter arrays to special microwave devices.
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