Optoelectronic Devices: Low‐Temperature Combustion‐Synthesized Nickel Oxide Thin Films As Hole‐Transport Interlayers for Solution‐Processed Optoelectronic Devices (adv. Energy Mater. 6/2014)
Sai Bai,Motao Cao,Yizheng Jin,Xinliang Dai,Xiaoyong Liang,Zhizhen Ye,Min Li,Jipeng Cheng,Xuezhang Xiao,Zhongwei Wu,Zhouhui Xia,Baoquan Sun,Ergang Wang,Yueqi Mo,Feng Gao,Fengling Zhang
DOI: https://doi.org/10.1002/aenm.201470030
IF: 27.8
2014-01-01
Advanced Energy Materials
Abstract:A solution-combustion strategy based on aqueous precursors is developed to fabricate nickel oxide (NiOx) thin films with excellent optical transparency, flat surface features, and a high work function. As reported by Yizheng Jin, Baoquan Sun, Feng Gao, and co-workers in article number 1301460, these are promising candidates for hole-transporting and electron-blocking interlayers in solution-processed optoelectronic devices.