Direct Observation of Conducting Nano Filaments in BMO Resistive Switching Memory

Chen-Fang Kang,Wei-Cheng Kuo,Chun-Wei Huang,Wen-Yuan Chang,Wen-Wei Wu,Ying-Hao Chu,Jr-Hau He
DOI: https://doi.org/10.1149/ma2012-02/37/2845
2012-01-01
Abstract:Resistance random access memory devices based on metal oxides could be a potential candidate for nextgeneration non-volatile memory (NVM). Although the resistive switching behaviors have been widely studied in previous reports, the real switching mechanis m is still unknown. It has been argued that the switching mechanis ms of nanofilaments are formed in the insulator layers, includ ing the conducting bridge system and phase change system, which have been observed experimentally. However, there are still several other types of filament format ion mechanisms being proposed but are only characterized indirectly. This study examined the electrical properties of the Pt/BMO/Pt devices which exhibit stable and reproducible bipolar resistive switching behavior with great endurance and retention properties. In addition, a new type of nanofilament, which is proven to be pure metals (Mn and Bi) characterized using highresolution transmission electron microscopy (HRTEM). The formation of nanofilament is probably due to an electrical-driv ing reductive mechanis m during the set processes. The high-density metallic nanofilaments indicate that the BMO thin film could reduce the cell size which can be successfully demonstrated by cross-bar structure. The Pt/BMO/Pt device reveals high potential for high-density NVM applications.
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