Memory Devices: Direct Observations of Nanofilament Evolution in Switching Processes in HfO2‐Based Resistive Random Access Memory by in Situ TEM Studies (adv. Mater. 10/2017)

Chao Li,Bin Gao,Yuan Yao,Xiangxiang Guan,Xi Shen,Yanguo Wang,Peng Huang,Lifeng Liu,Xiaoyan Liu,Junjie Li,Changzhi Gu,Jinfeng Kang,Richeng Yu
DOI: https://doi.org/10.1002/adma.201770065
IF: 29.4
2017-01-01
Advanced Materials
Abstract:Resistive switching processes in HfO2 are demonstrated by electron holography and in situ energy filtered imaging in article number 1602976 by Jinfeng Kang, Richeng Yu, and co-workers. The results identify that oxygen vacancies are generated gradually in the oxide layer under ramped electrical bias, resulting in the formation of conductive channels, and the switching process occurs at the top interface of the hafnia layer.
What problem does this paper attempt to address?