Direct Observations of Nanofilament Evolution in Switching Processes in HfO2‐Based Resistive Random Access Memory by in Situ TEM Studies

Chao Li,Bin Gao,Yuan Yao,Xiangxiang Guan,Xi Shen,Yanguo Wang,Peng Huang,Lifeng Liu,Xiaoyan Liu,Junjie Li,Changzhi Gu,Jinfeng Kang,Richeng Yu
DOI: https://doi.org/10.1002/adma.201602976
IF: 29.4
2017-01-01
Advanced Materials
Abstract:Resistive switching processes in HfO2 are studied by electron holography and in situ energy-filtered imaging. The results show that oxygen vacancies are gradually generated in the oxide layer under ramped electrical bias, and finally form several conductive channels connecting the two electrodes. It also shows that the switching process occurs at the top interface of the hafnia layer.
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