Silicon Oxide Thickness-Dependent Growth of Carbon Nanotubes

AY Cao,PM Ajayan,G Ramanath,R Baskaran,K Turner
DOI: https://doi.org/10.1063/1.1636826
IF: 4
2004-01-01
Applied Physics Letters
Abstract:Recent discovery of substrate-selective growth of carbon nanotubes on SiO2 in exclusion to Si, has opened up the possibility of organizing nanotubes on Si/SiO2 patterns in premeditated configurations for building devices. Here, we report the strong dependence of nanotube growth on the SiO2 layer thickness, and the utility of this feature to build three-dimensional architectures. Our results show that there is no detectable nanotube growth on SiO2 layers with thickness (TSiO2) less than ∼5–6 nm. For 6 nm50 nm. We grew nanotubes with multiple lengths at close proximity in a single step by using substrates with regions of different TSiO2. Such processing strategies would be attractive for creating nanotube mesoscale architectures for device applications.
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