Hanle-Effect Measurements of Spin Injection from Mn5ge3c0.8/Al2o3-Contacts into Degenerately Doped Ge Channels on Si

Inga Anita Fischer,Li-Te Chang,Christoph Suergers,Erlend Rolseth,Sebastian Reiter,Stefan Stefanov,Stefano Chiussi,Jianshi Tang,Kang L. Wang,Joerg Schulze
DOI: https://doi.org/10.1063/1.4903233
IF: 4
2014-01-01
Applied Physics Letters
Abstract:We report electrical spin injection and detection in degenerately doped n-type Ge channels using Mn5Ge3C0.8/Al2O3/n^+-Ge tunneling contacts for spin injection and detection. The whole structure is integrated on a Si wafer for complementary metal-oxide-semiconductor compatibility. From three-terminal Hanle-effect measurements, we observe a spin accumulation up to 10 K. The spin lifetime is extracted to be 38 ps at T = 4K using Lorentzian fitting, and the spin diffusion length is estimated to be 367 nm due to the high diffusion coefficient of the highly doped Ge channel.
What problem does this paper attempt to address?