Formation of Epitaxial Tl2ba2ca2cu3o10 Superconducting Films by Dc-Magnetron Sputtering and Triple Post-Annealing Method

Xie Wei,Wang Pei,Ji Lu,Ge De-Yong,Du Jia-Nan,Gao Xiao-Xin,Liu Xin,Song Feng-Bin,Hu Lei,Zhang Xu,He Ming,Zhao Xin-Jie
DOI: https://doi.org/10.1088/1674-1056/23/7/077401
2014-01-01
Chinese Physics B
Abstract:For obtaining pure phase Tl2Ba2Ca2Cu3O10(Tl-2223) films with good superconducting properties, the growth technique is improved by dc magnetron sputtering and a triple post-annealing process. The triple post-annealing process comprises annealing twice in argon and once in oxygen at different temperatures. In the first low-temperature annealing phase in argon, Tl2Ba2CaCu2O8(Tl-2212) is obtained to effectively minimize evaporation in the next step. With the increase of temperature in the second annealing stage in argon, the previously prepared Tl-2212 inter-phase is converted into Tl-2223phase. An additional annealing in oxygen is also adopted to improve the properties of Tl-2223 films, each containing an optimal oxygen content value. The results of X-ray diffraction(XRD) θ–2θ scans, ω scans and rotational φ scans show that each of the Tl-2223 films has a high phase purity and an epitaxial structure. Smooth films are observed by scanning electron microscopy(SEM). The critical temperatures Tc of the films are measured to be about 120 K and the critical current densities Jc can reach 4.0 MA/cm2at 77 K at self field.
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