Temperature-dependent Electrical Property and Optical Transparency of Al/Ga-doped ZnO Double-Layer System

Ying Li,Xiaofang Bi
DOI: https://doi.org/10.1007/s00339-013-7793-1
2013-01-01
Applied Physics A
Abstract:Al (5 nm)/Ga-doped ZnO (GZO, 100 nm) double-layer films were prepared at room temperature by magnetron sputtering. It is found that the crystal structure of GZO is degraded due to the existence of Al layer. Semiconductor transport behavior is observed in GZO and Al/GZO films in the temperature range of 80∼360 K. As opposed to that of GZO, the resistivity of Al/GZO shows a significant decrease with increasing the temperature from 320 to 360 K. To understand the temperature dependent resistivity, Al (5 nm)/GZO film was annealed in vacuum in the temperature range of 398∼573 K. High-resolution TEM observations reveal that Al grains become more and more isolated as the annealing temperature increases. The decreasing resistivity above 320 K for the Al/GZO system is considered to be caused by the substitution of Al atoms for Zn atoms at the interface, showing an improvement in the transmittance with over 90 % especially at 398 K.
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