Abstract:Highly optically transparent and electrically conductive Al-doped ZnO (AZO) thin films with varied Al concentrations were synthesized by means of reactive deposition of ZnO host films and in-situ doping of Al by pulsed laser co-ablation of a Zn target and an Al target with the assistance of an oxygen plasma. The optical and electrical properties of AZO films were tailored by the adjustment of Al concentration which was realized by varying the laser fluence on the Al target. The morphology, composition and structure as well as the optical and electrical properties were characterized and the effects of Al doping and post-deposition annealing were investigated. Similar with undoped ZnO, the synthesized AZO films have a hexagonal wurtzite structure with the crystallinity deteriorated, present high visible transparency with the absorption edge blue shifted and show good electrical properties with the electrical conductivity increased. The structural, optical and electrical properties are strongly dependent on Al concentration and are significantly improved after annealing in H2/N2 mixed gas. Annealed AZO films containing 3.0at% Al have optical properties including an absorption edge near 325nm and an optical band gap of 3.67eV and electrical properties covering an electrical resistivity of 5.27 × 10−4Ωcm and a carrier concentration of 1.11 × 1021cm−3 with a Hall mobility of 10.7cm2/V s.

Optical and Electrical Properties of Al-doped ZnO Thin Films by Atomic Layer Deposition

Characteristics of Atomic Layer Deposited Transparent Aluminum-Doped Zinc Oxide Thin Films at Low Temperature

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Studies on Morphology, Electrical and Optical Characteristics of Al-doped ZnO Thin Films Grown by Atomic Layer Deposition

Effect of Film Thickness on Properties of Al-Doped Zno Film As Transparent Conducting Electrodes in Oleds

Influence of Deposition Temperature on the Crystallinity of Al-doped ZnO Thin Films at Glass Substrates Prepared by RF Magnetron Sputtering Method

A Comparative Study of Growth and Properties of Atomic Layer Deposited Transparent Conductive Oxide of Al Doped ZnO Films from Different Al Precursors

Tailoring of Optical and Electrical Properties of Transparent and Conductive Al-doped ZnO Films by Adjustment of Al Concentration

Microstructure and Electrical Properties of Al-doped ZnO Thin Films

Atomic layer deposition of Al-doped ZnO films using aluminum isopropoxide as the Al precursor

Semiconducting properties of Al doped ZnO thin films

Influence of Al Doping on the Properties of Zno Thin Films Grown by Atomic Layer Deposition

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition

Transparent Conductive Al-Doped Zno Thin Films Grown at Room Temperature

Optical Properties of Al-doped ZnO Thin Films by Ellipsometry

Effects of deposition power and pressure on the crystallinity of Al-doped ZnO thin films at glass substrates by low temperature RF magnetron sputtering

Al-Doping Effects on Structure, Electrical and Optical Properties of C-Axis-Orientated Zno : Al Thin Films

Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process

Study on Aluminum Concentration on Optical and Electrical Properties of AZO Thin Films Fabricated by Ultrasonic Spray Pyrolysis

High Quality Al‐doped ZnO Thin Films Deposited Using Targets Prepared by Chemical Coprecipitation

Influence of Substrate Temperature on Mechanical, Optical and Electrical Properties of ZnO:Al Films