Influence of Substrate Temperature on Mechanical, Optical and Electrical Properties of ZnO:Al Films

Ruitao Wen,Laisen Wang,Xuan Wang,Guang-Hui Yue,Yuanzhi Chen,Dong-Liang Peng
DOI: https://doi.org/10.1016/j.jallcom.2010.08.034
IF: 6.2
2010-01-01
Journal of Alloys and Compounds
Abstract:The Al-doped zinc oxide (ZnO:Al) films were prepared on quartz glass flakes and silicon wafers by radio frequency (RF) magnetron sputtering which uses an aluminum-doped zinc oxide ceramic target. Meanwhile, their properties were characterized by scanning electron microscopy, X-ray diffraction, infrared-UV spectrophotometry, resistance measurement, nano-scratch and indentation test. Evolutions of the structural, optical, electrical and mechanical properties of the ZnO:Al films as a function of substrate temperatures ranging from room temperature to 400°C were analyzed. The results indicate that the ZnO:Al films with a low resistivity value of 4.97×10−4Ωcm, a relatively higher adhesion and a high transparency above 90%, can be prepared at a substrate temperature of 400°C.
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