Preparation of YBa2Cu3O7−δ Thin Films by Magnetron Sputtering with I N S I T U Plasma Oxidation

SZ YANG,PH WU,ZM JI,ZJ SUN,RJ ZHANG,Y LI,SY ZHANG,HC ZHANG,HM LIU
DOI: https://doi.org/10.1063/1.346536
IF: 2.877
1990-01-01
Journal of Applied Physics
Abstract:Superconducting YBa2Cu3O7−δ thin films with surface roughness Ra∼20 Å have been successfully prepared by either rf or dc magnetron sputtering. The substrate temperature was kept at 600–670 °C during deposition and a subsequent in situ plasma oxidation treatment was performed at 480–520 °C. The films deposited on single-crystal SrTiO3 (100) exhibited zero resistance at 91 K and had the critical current density of 3×106 A/cm2. In this paper we describe the influences of fabrication conditions on film superconductivity.
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