Arsenic-induced Etched Nanovoids on GaSb (100)

S. H. Huang,G. Balakrishnan,M. Mehta,L. R. Dawson,D. L. Huffaker,P. Li
DOI: https://doi.org/10.1063/1.2772532
IF: 2.877
2007-01-01
Journal of Applied Physics
Abstract:We describe in situ nanoscale etch-pit formation on GaSb (100) surfaces as a result of exposure to an As2 flux in molecular beam epitaxy. The pits form as a result of an Sb-displacement reaction that occurs between the GaSb substrate and the impinging As adatoms. The nanoscale surface features are highly crystallographic with a strong preference for {111} planes, similar to other etching techniques. Nanopit dimensions and density increase with As exposure time. For the 60 s exposure analyzed in this article, the pits vary in both size and shape with average dimensions ∼25 nm wide and 50–80 nm long and 10–70 nm deep, with density of ∼1×109/cm2. Subsequent GaAs overgrowth proceeds by a coalescence mechanism leaving interfacial nanovoids and finally highly planar bulk layers.
What problem does this paper attempt to address?