Microstructure, Mechanical, and Tribological Properties of CN X Thin Films Prepared by Reactive Magnetron Sputtering

Xiangyang Chen,Jin Zhang,Shengli Ma,Haixia Hu,Zhebo Zhou
DOI: https://doi.org/10.1007/s40195-013-0004-4
2014-01-01
Acta Metallurgica Sinica (English Letters)
Abstract:The microstructure, mechanical, and tribological properties of the carbon nitride (CN x ) thin films with different nitrogen contents deposited on high-speed steel substrates by reactive magnetron sputtering were studied. CN x films with nitrogen contents from 10.7 to 28.2 at.% had an amorphous structure composing of the carbon bonds of sp 2 C–C, sp 2 C–N, and sp 3 C–N. The TiN inter-layer cause the adhesion of CN x films enhancement. The more nitrogen concentration led to larger film hardness and friction coefficient against GCr15 steel balls, but the wear rates decreased.
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