Improving mechanical properties of a-CNx films by Ti-TiN/CN x gradient multilayer

DongGuang Liu,Jiangping Tu,ChunFu Hong,Changdong Gu.,Yongjin Mai,Rongsheng Chen
DOI: https://doi.org/10.1016/j.apsusc.2010.07.018
IF: 6.7
2010-01-01
Applied Surface Science
Abstract:Amorphous carbon nitride (a-CNx) films with functional gradient Ti–TiN/CNx underlayer were deposited by direct current magnetron sputtering. Microstructure and composition of the films were characterized by means of X-ray diffraction (XRD), Raman spectroscopy, atomic force microscope (AFM) and transmission electron microscopy (TEM). Mechanical and tribological properties were investigated by nanoindenter, scratch and ball-on-disk tribometer. The a-CNx-based films suffer a graphitization process with the increasing deposition temperature, thus the hardness and elastic modulus decrease. With the design of the Ti–TiN/CNx gradient underlayers, some important advantages of relatively thick CNx films can be achieved, such as increased hardness, improved adhesion strength, and the wear resistance of the a-CNx-based films can be also improved significantly.
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