Microstructure and Tribological Properties of Ti-contained Amorphous Carbon Film Deposited by DC Magnetron Sputtering

R. L. Li,J. P. Tu,C. F. Hong,D. G. Liu,D. H. Zhou,H. L. Sun
DOI: https://doi.org/10.1063/1.3272018
IF: 2.877
2009-01-01
Journal of Applied Physics
Abstract:Pure amorphous carbon (a-C) film and that with a small amount of Ti were deposited on high speed steel (W18Cr4V) substrates by means of dc closed field unbalanced magnetron sputtering. The chemical composition and microstructure of the a-C films were performed using x-ray photoelectron spectroscopy, x-ray diffraction, Raman spectra, and transmission electron microscopy. The mechanical and tribological properties were evaluated using a nanoindentor, Rockwell and scratch tests, and a conventional ball-on-disk tribometer, respectively. The pure a-C film showed the high hardness (53 GPa), elastic modulus (289 GPa), but the poor adhesive strength. When adding a small amount of Ti to the a-C film, both the adhesive strength and the tribological properties were improved. The Ti contained a-C film had the low wear rate (1.9×10−17 m3 N−1 m−1) and friction coefficient in humid air.
What problem does this paper attempt to address?