Dynamic Moderation of an Electric Field Using a SiO2 Switching Layer in TaOx ‐based ReRAM

Qi Wang,Yaomi Itoh,Tohru Tsuruoka,Shintaro Ohtsuka,Tomohiro Shimizu,Shoso Shingubara,Tsuyoshi Hasegawa,Masakazu Aono
DOI: https://doi.org/10.1002/pssr.201409531
2015-01-01
Abstract:ReRAMs using oxygen vacancy drift in their resistive switching are promising candidates as next generation memory devices. One remaining issue is degradation of the on/off ratio down to 10 2 or less with an increased number of switching cycles. Such degradation is caused by a local hard breakdown in a set process due to a very high electric field formed just before the completion of a conductive filament formation. We found that introducing an ultra‐thin SiO 2 layer prevents the hard breakdown by dynamical moderation of the electric field formed in the TaO x matrix, resulting in repeated switching while retaining a higher on/off ratio of about 10 5 . (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)
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