A Comparative Study Of Gate Structures For 9.4-Kv4h-Sic Normally On Vertical Jfets

Woongje Sung,Edward Van Brunt,B. Jayant Baliga,Alex Q. Huang
DOI: https://doi.org/10.1109/TED.2012.2203337
2012-01-01
Abstract:This paper reports the development of 9.4-kV 4H-SiC normally on lateral-channel vertical JFETs. The developed JFETs utilize a buried layer to create a lateral conduction channel, shielding the source from the effects of drain bias. The lowest measured R-on,(sp) was 127 m Omega.cm(2). Measurements indicate that the channel resistivity can be further reduced by channel optimization. The fabricated JFETs exhibit pentode-like I-D-V-DS characteristics with a high forward direct-current blocking gain of over 500. This paper provides a comparative study of gate structures in order to achieve the lowest ON-state switching losses and to provide stable forward blocking characteristics for a normally on JFET.
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