Fabrication of Magnetic Random Access Memory Based on Nanoring-Type Magnetic Tunnel Junctions and Spin-Polarized Current Driving
Xiangyu Han,Hongxiang Wei,Zhilong Peng,Hung‐Hsiang Yang,Jun Feng,Gaofeng Du,Zhelin Sun,Lixue Jiang,Q. H. Qin,Meng Ma,Y. Wang,Zhan Wen,D.P. Liu,Ws Zhan
2007-01-01
Abstract:Submitted for the MAR07 Meeting of The American Physical Society Fabrication of magnetic random access memory based on nanoring-type magnetic tunnel junctions and spin-polarized current driving X.F. HAN1, H.X. WEI, Z.L. PENG, H.D. YANG, J.F. FENG, G.X. DU, Z.B. SUN, L.X. JIANG, Q.H. QIN, M. MA, Y. WANG, Z.C. WEN, D.P. LIU, W.S. ZHAN, Institute of Physics, Chinese Academy of Science, Beijing 100080, China — Nanoring-type magnetic tunnel junctions (NR-MTJs) of Ta/IrMn/CoFe/Ru/CoFeB/Al-O/CoFeB/Ta/Ru were nano-fabricated on the Si/SiO2 substrate. The small NR-MTJs with the outerand inner-diameter of 100 and 50 nm were nano-fabricated and the corresponding NR-MTJ array integrated above the transistors in CMOS circuit for 4x4 MRAM DEMO devices. The magnetoresistance (R) versus current (I) loops for a spin-polarized current switching were measured and the TMR ratio larger than 20% at room temperature were observed. The critical switching current for the free CoFeB layer between parallel and antiparallel magnetization states is smaller than 750 μA in such NRMTJs. After each positive and negative pulse writing current the high and low resistance of a NR-MTJ as a MRAM bite were read out using a low read current of between 10 and 20 μA. It shows that the MRAM fabrication with the density higher than 5 Gbite/inch2 are possible based on 1 NR-MTJ + 1 transistor structure and spin-polarized current switching. 1Correspondence author X. F. Han Institute of Physics, Chinese Academy of Science, Beijing 100080, China Date submitted: 28 Dec 2006 Electronic form version 1.4