High-performance Type-y Spin-orbit Torque MRAM Devices

Hongchao Zhang,Shiyang Lu,Kaihua Cao,Hongxi Liu,Weisheng Zhao
DOI: https://doi.org/10.1109/INTERMAGShortPapers58606.2023.10228544
2023-01-01
Abstract:We demonstrated in-plane field-free-switching spin-orbit torque (SOT) magnetic tunnel junction (MTJ) devices capable of low switching current density, fast speed, high reliability and most importantly, manufactured uniformly by the 200 mm-wafer platform. The SOT-MTJ devices are integrated on 200 m-wafers using two-metal-layers back-end-of-line (BEOL) process. The performances of the devices are systematically studied, including magnetic properties, endurance, data retention and switching dynamic of the devices. Specifically, the devices exhibit low critical switching current density J <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">C</inf> ~160 MA/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> at 0.3 ns, high tunneling magnetoresistance (TMR) ratios exceeding 100%, ultra-high endurance over 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">12</sup> cycles, and excellent thermal stability Eb > 100 k <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">B</inf> T. The research provides flexible solutions for high-speed and energy efficient memory applications. As a prospective, it is expected to obtain excellent performance of the devices through further optimizing the MTJ film stacks and corresponding fabrication processes.
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