Comparative Investigation on the Repetitive Short-Circuit Capability of 100 V Commercial p-GaN Gate Power HEMTs With Different Processing and Structure
Xiangdong Li,Meng Wang,Hongyue Wang,Jincheng Zhang,Shuzhen You,Junbo Wang,Zhanfei Han,Weitao Yang,Yue Hao
DOI: https://doi.org/10.1109/ted.2024.3365780
IF: 3.1
2024-01-01
IEEE Transactions on Electron Devices
Abstract:Reliability of 100-V p-GaN gate power high-electron-mobility transistors (HEMTs) under repetitive short-circuit (SC) stress is investigated in this work, which is a vital topic nowadays because GaN devices are quickly penetrating the medium-and low-voltage power electronics market. In this work, two devices with different processing and structure are compared. Under the stress condition of V $_{\text{DD}}$ $=$ 60 V, V $_{\text{GS}}$ $=$ 5.8 V, and pulsewidth of 10 $\mu $ s, both the devices show a certain level of degradation with positive V $_{\text{TH}}$ shift and current collapse, but no catastrophic failure even after 1000-cycle stress. Guidelines for understanding the failure mechanism and improving the SC capability are achieved as: 1) the floating field plate is effective to smoothen the peak electric field; 2) the extended p-GaN ledge may weaken the electric field crowding effect, reduce the hot carrier injection, and push the trapping area away from the gate area; and 3) higher gate leakage current is beneficial to suppress the positive V $_{\text{TH}}$ shift during the SC stress by discharging the negative charges. These guidelines are of paramount significance to promote the SC withstand capability for the p-GaN gate power HEMTs in the future.
engineering, electrical & electronic,physics, applied