Abstract:Silicon substrates treated by metal-assisted chemical etching have been studied for many years since they could be employed in a variety of electronic and optical devices such as integrated circuits, photovoltaics, sensors and detectors. However, to the best of our knowledge, the chemical etching treatment on the same silicon substrate with the assistance of two or more kinds of metals has not been reported. In this paper, we mainly focus on the etching time and finally obtain a series of superhydrophobic silicon surfaces with novel etching structures through two successive etching processes of Cu-assisted and Ag-assisted chemical etching. It is shown that large-scale homogeneous but locally irregular wire-like structures are obtained, and the superhydrophobic surfaces with low hysteresis are prepared after the modifications with low surface energy materials. It is worth noting that the final silicon substrates not only possess high static contact angle and low hysteresis angle, but also show a black color, indicating that the superhydrophobic silicon substrate has an extremely low reflectance in a certain range of wavelengths. In our future work, we will go a step further to discuss the effect of temperature, the size of Cu nanoparticles and solution concentration on the final topography and superhydrophobicity.

Wet chemical etching silicon wafer with low-reflection and super-hydrophobicity

FABRICATION OF LARGE-AREA SILICON NANOWIRE ARRAYS FOR SOLAR CELLS

Si Nanowires Arrays Fabricated by Wet Chemical Etching for Antireflection and Self-Cleaning

Synthesis of superhydrophobic silicon oxide nanowires surface on silicon wafer.

Superhydrophobic Silicon Surfaces with Low Light Reflectivity

Super-wetting, wafer-sized silicon nanowire surfaces with hierarchical roughness and low defects

Highly-efficient low cost anisotropic wet etching of silicon wafers for solar cells application

Two Scale Roughness, Self-Cleaning, and Low Reflectivity Silicon Surface for Solar Cell Applications

Simple Approach to Wafer-Scale Self-Cleaning Antireflective Silicon Surfaces.

Fabrication of antireflective silicon nanowires array

Direct Synthesis Of Superhydrophobic Silica Nanowires Surface By Evaporating Zns On Silicon Wafer

Micro/nano structure size effect on superhydrophobicity and anti reflection of single crystalline Si solar cells

Fabrication of Ultra-Low Antireflection SiNWs Arrays from Mc-Si Using One Step MACE

Facile Method To Fabricate a Large-Scale Superhydrophobic Surface by Galvanic Cell Reaction

Improved antireflection properties and optimized structure for passivation of well-separated, vertical silicon nanowire arrays for solar cell applications

A Metal-Free Additive Texturization Method Used for Diamond-Wire-sawn Multi-Crystalline Silicon Wafers

Research on Controllable Preparation and Antireflection Properties of Zigzag SiNWs Arrays

Preparation and Characterization of Silicon Nanowire Arrays for Solar Cell

Fabrication Of Highly Antireflective Silicon Surfaces With Superhydrophobicity

FABRICATION OF SILICON NANOWIRE (SiNW) ARRAYS AND APPLICATION IN SOLAR CELL

Inspired Superhydrophobic Surfaces by A Double-Metal-Assisted Chemical Etching Route