Superhydrophobic Silicon Surfaces with Low Light Reflectivity

Yonghao Xiu,Yan Liu,Dennis W Hess,C. P. Wong
DOI: https://doi.org/10.1557/PROC-1158-F03-07
2009-01-01
Abstract:Creation of superhydrophobic self-cleaning surfaces is an important objective for a variety of applications. Indeed, numerous routes to generate superhydrophobic surfaces have been proposed. In this paper, a facile way of forming superhydrophobic surfaces is reported that uses Au assisted HF/H 2 O 2 etching of silicon wafers. The Au layer was deposited onto a silicon wafer via e-beam evaporation. By controlling the evaporation and etching times, the surface roughness can be manipulated and superhydrophobic surfaces with reduced light reflection can be generated. Contact angles were measured with a CCD camera equipped goniometer; these values determined the water repellency. Light reflection on the as prepared black surfaces was measured to assess the efficiency for low cost solar cell applications. This approach offers a new way both to theoretically study the surface roughness effect and to investigate engineering applications of self-cleaning surfaces in solar cells, MEMS, anti-bacteria coating, and microfluidic devices.
What problem does this paper attempt to address?