Growth and Characteristics of Hydrogenated Ga-doped ZnO Thin Films by Pulsed DC Magnetron Sputtering at Room Temperature

Fei WANG,Xin-liang CHEN,Chi ZHANG,De-kun ZHANG,Chang-chun WEI,Qian HUANG,Xiao-dan ZHANG,Ying ZHAO,Xin-hua GENG
DOI: https://doi.org/10.3969/j.issn.1000-985X.2011.06.009
2011-01-01
Abstract:Hydrogenated Ga-doped ZnO thin films (ZnO:Ga/H, GZO/H) for thin film solar cells were deposited by pulsed DC magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of GZO/H films and textured surface GZO/H films were investigated with different H 2-flow. The results indicated that all the GZO/H thin films are polycrystalline structure with a preferential orientation of the c-axis perpendicular to the substrate. The GZO/H thin films show a rather lower resistivity and a higher relatively carrier concentration and mobility than the GZO thin films. The GZO/H thin film grown at 6 sccm of H 2-flow rate shows an excellent electrical property with a resistivity of 6.8×10 -4 Ω·cm, and a Hall mobility of 34.2 cm 2/Vs. The optical transmission of the GZO/H thin films have a great increase in short wave length when added H 2 into vacuum during sputtering processes, and the optical transmission of the AZO/H thin films are >85% in the visible range. In addition, the effects of H 2-flow on structure of the GZO/H films after wet etching have been studied. The formation model of textured surface GZO/H films is introduced.
What problem does this paper attempt to address?