Impact of Metallic Shields on Characteristics of Microcrystalline Si Solar Cell on Flexible Substrates

Liu Cheng,An Qi,Zhou Lihua,Qian Ziqing,Ye Xiaojun,Chen Mingbo
DOI: https://doi.org/10.3969/j.issn.1672-7126.2011.01.25
2011-01-01
Abstract:The hydrogen terminated, microcrystalline silicon (μ c-Si: H) films, used to fabricate solar cells, were grown by plasma enhanced chemical vapor depositionon flexible substrates. The impacts of the deposition conditions, including contents of silane, the metallic shield, and deposition rate, on microstructures and optical properties of the films were studied. The results show that the metallic shield installed in the film growth setup strongly affects the silicon deposition rate. For instance, removal of the shield doubled the Si deposition rate. The content of silane also influenced the phase transition from microcrystalline phase to amorphous phase. The conversion efficiencies of the tandem solar cells, made with a-Si: H/μ c-Si: H films deposited under optimized condition without the metallic shields on flexible, stainless steel substrates, were found to be 9.28% (AM0, 1353 W/m2) and 11.26 %(AM1.5, 1000 W/m2), respectively.
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