Optimization and Fabrication of Chromium Grating in Self-Traceable Interferometer
Zichao Lin,Yulin Yao,Zhangning Xie,Dongbai Xue,Tong Zhou,Zhaohui Tang,Lihua Lei,Tao Jin,Xiong Dun,Xiao Deng,Xinbin Cheng,Tongbao Li
DOI: https://doi.org/10.1016/j.precisioneng.2023.12.008
2024-01-01
Abstract:Metrological methods rooted in natural constants present a robust strategy for ensuring traceability in nanometric measurements. A Chromium (Cr) grating, meticulously constructed through atom lithography and possessing a pitch of d = 212.7705 +/- 0.0049 nm intrinsically traceable to the Cr transition frequency 7S3 -> 7P40, exhibits promising potential as a self-traceable length standard in nano-length metrology via a grating interferometer. The objective of this research is to elucidate and optimize the diffraction characteristics that augment the Cr grating's functionality as a self-traceable length standard within the length traceability chain predicated on the Cr transition frequency. To this end, we explore the geometric morphology and diffraction characteristics of the Cr grating. This investigation also dissects the influence of the grating's polarization-sensitive traits on the Littrow configuration grating interferometer and establishes the criteria for Cr grating fabrication. Empirically, we fabricate an enlarged Cr grating through scanning atom lithography, delineate its diffraction performance, and perform an initial verification of length measurement in a self-traceable grating interferometer. This investigation aligns with the global progression towards a more streamlined metrology development, offering a valuable benchmark for propelling future advancements in metrological technologies within the new traceability chain.