Abstract:High-aspect ratio x-ray absorption gratings are required for hard x-ray or high-resolution soft x-ray phasecontrast imaging (XPCi) applications. X-ray gratings play a central role in grating-based XPCi techniques, where visibility – image quality – is highly dependent on the quality of gratings. Although the fabrication process of x-ray gratings for soft x-ray imaging is well-developed, there are technological challenges in highresolution hard x-ray imaging that impede us from making high-aspect ratio large field-of-view fine x-ray gratings through conventional fabrication processes. Here we present a design and a fabrication process to fabricate highaspect ratio gratings that benefit from a self-aligned hard-mask – a patterned chromium-gold-chromium thin film deposited on a transparent ITO-on-glass substrate – which facilitates both lithography and electroplating processes. The repeatability of the proposed method makes it suitable for achieving high-aspect ratio fine structures as thick as desired through a multi-layer structure without any restraint or limitation on the aspect ratio of features. The multi-layer structure design overcomes the aspect ratio limitation associated with UVlithography. Although this method works well with X-ray lithography, the key advantage of this design is that it enables UV lithography for high-aspect ratio grating fabrication through a reliable yet simple process. To the best of our knowledge, self-aligned multi-layer SU-8 based grating design has not been previously reported. The proposed design and fabrication process help researchers further develop x-ray gratings performance to facilitate high-resolution coded-aperture and Talbot-Lau high-energy x-ray phase-contrast imaging.

High Aspect Ratio Grating Fabrication in Su-8 Resist by Uv-Curing Nanoimprint

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High Density Patterns Fabricated in SU-8 by UV Curing Nanoimprint

A nanoimprint lithography for fabricating SU-8 gratings for near-infrared to deep-UV application

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Fabrication of Metal Micro-Grating with High Aspect Ratio on Metal Substrate

High aspect ratio tungsten grating on ultrathin Si membranes for extreme UV lithography.

Self-aligned fabrication of high-aspect ratio high-resolution x-ray gratings

Fabrication of 150 Nm Half-Pitch Grating Templates for Nanoimprint Lithography

Fabrication of High Aspect Ratio Gratings for X-ray Imaging

The fabrication of high-performance diffraction gratings via vibration-assisted UV nanoimprinting lithography

Fabrication of High-Aspect-ratio Microstructures Using SU8 Photoresist

Nanoimprint lithography for optic fluidics with phase gratings for environmental monitoring application

Development of Novel SU-8 Based Nanoimprint Lithography

Double transfer UV-curing nanoimprint lithography.

Polymeric Nanostructures Fabricated by Dynamic Nanoinscribing Technique and Its Applications

Fabrication of High-Aspect-ratio and High-Density X-ray Transmission Grating

Fabrication of High Aspect Ratio Silicon Gratings by Interference Lithography and Potassium Hydroxide Anisotropic Etch Technique

Fabrication of Nanoscale Gratings by Nanoimprint on Silicon Wafer

A Study on the Fabrication of Nanostructures with High Aspect Ratio and Large Area Uniformity