Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

High Density Patterns Fabricated in SU-8 by UV Curing Nanoimprint

A nanoimprint lithography for fabricating SU-8 gratings for near-infrared to deep-UV application

Development of Novel SU-8 Based Nanoimprint Lithography

Optical Nanostructures Fabricated by Su-8 Based Nanoimprint Lithography

Double transfer UV-curing nanoimprint lithography.

Regular Nano-Pores Fabricated by UV Cross-Linking Non-softbaked SU-8 Resist in a Solvent Evaporation Controlled Environment

Patterned Microstructure Array Fabrication By Using A Novel Standing Surface Acoustic Wave Device

Applications Of Nanoimprint Lithography For Biochemical And Nanophotonic Structures Using Su-8

Fabrication of micro/nano fluidic channels by nanoimprint lithography and bonding using SU-8

Unconventional Lithography for Patterned Nanomaterials

A novel fabrication method of embedded micro-channels by using SU-8 thick-film photoresists

Fabrication of Metallic Patterns on Highly Curved Substrates Via Nanoimprint Lithography in Association with an Etch-in Process

Nanoimprint lithography for optic fluidics with phase gratings for environmental monitoring application

Fabrication of SU-8 polymer micro/nanoscale nozzle by hot embossing method

Simulation of Pattern Transfer Accuracy on SU-8 Resist

Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 Nm Resolution

Fabrication of Patterned Concave Microstructures by Inkjet Imprinting

Density variation of nanoscale patterns in thermal nanoimprint lithography

Nanophotonic Crystals with Chiral Elements by a Hot Embossing Process in SU-8

Simplified microfabrication technology for producing SU-8 microstructures with high aspect ratio

Duplication of Nanoimprint Templates by a Novel SU-8/SiO2/PMMA Trilayer Technique